Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics - Chris R. Kleijn - Books - Springer Basel - 9783034877435 - November 20, 2013
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Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics Softcover reprint of the original 1st ed. 1993 edition

Chris R. Kleijn

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Modeling of Chemical Vapor Deposition of Tungsten Films - Progress in Numerical Simulation for Microelectronics Softcover reprint of the original 1st ed. 1993 edition

Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.

140 pages, black & white illustrations

Media Books     Paperback Book   (Book with soft cover and glued back)
Released November 20, 2013
ISBN13 9783034877435
Publishers Springer Basel
Pages 139
Dimensions 152 × 229 × 7 mm   ·   195 g
Language German  

See all of Chris R. Kleijn ( e.g. Paperback Book )