Pld of Silicon Nanostructures for Pv Applications

The experimental results reported herein thesis book provide interesting information about the synthesis of nanostructured silicon film by PLD. The capability to finely tune the morphology and consequently the optical properties of the nanostructures by properly adjusting the experimental parameters during the deposition paves the way to interesting applications in the field of photovoltaics. The work underlines the importance of of the background gas pressure in the PLD process for the synthesis of nanostructured crystals even at room temperature. This opens the way to further investigate with aim of developing nanoscale devices on low cost glass substrates for high efficiency Si-based third generation solar cells.