Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - SpringerBriefs in Applied Sciences and Technology - Seiji Samukawa - Books - Springer Verlag, Japan - 9784431547945 - February 17, 2014
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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - SpringerBriefs in Applied Sciences and Technology 2014 edition

Seiji Samukawa

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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - SpringerBriefs in Applied Sciences and Technology 2014 edition

Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data.

40 pages, 30 Illustrations, color; 5 Illustrations, black and white; VIII, 40 p. 35 illus., 30 illus

Media Books     Paperback Book   (Book with soft cover and glued back)
Released February 17, 2014
ISBN13 9784431547945
Publishers Springer Verlag, Japan
Pages 40
Dimensions 155 × 235 × 222 mm   ·   86 g
Language English  

See all of Seiji Samukawa ( e.g. Paperback Book )