Design a Slit HDP Semiconductor Plasma Dry Etcher - Kung Linliu - Books - Independently Published - 9798561298431 - November 8, 2020
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Design a Slit HDP Semiconductor Plasma Dry Etcher

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In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.

Media Books     Paperback Book   (Book with soft cover and glued back)
Released November 8, 2020
ISBN13 9798561298431
Publishers Independently Published
Pages 140
Dimensions 152 × 229 × 8 mm   ·   195 g
Language English  

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