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Design a Slit HDP Semiconductor Plasma Dry Etcher
Kung Linliu
Design a Slit HDP Semiconductor Plasma Dry Etcher
Kung Linliu
In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.
Media | Books Paperback Book (Book with soft cover and glued back) |
Released | November 8, 2020 |
ISBN13 | 9798561298431 |
Publishers | Independently Published |
Pages | 140 |
Dimensions | 152 × 229 × 8 mm · 195 g |
Language | English |